Professor Ramesh runs a large complex oxide growth cluster consisting of multiple (3) excimer lasers and 11 chambers in his lab. All growth systems are optimized for growth of top-notch oxide thin films. The center-pieces of the growth center are four reflection high-energy electron diffraction (RHEED) equipped chambers in which one can monitor the intensity oscillations as a function of time, enabling one to maintain a nearly perfect surface throughout the entire structure. These systems allow for growth of oxides with real-time, in situ monitoring at up to 300 mTorr pressures of O2. The remaining systems are optimized for high-throughput of a wide range of materials – there are very few materials that are off-limits for study in these systems. This gives the research program great flexibility in the search for new materials and functionalities. The lab houses a 200mm PVD system for scale up activities as well as a UHV PVD system for nonoxides. In addition to this, he has developed extensive structure, surface, and electronic testing facilities within his own facilities. This is augmented by access to user facilities both within the department, the college of engineering and campus.
The job description is as follows:
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Berkeley, CA